Mr. Tim Fernback reports

TEMAS'S RCL CRITICAL MINERALS PATENT PORTFOLIO EXPANDS INTO VANADIUM

Following the recent completion of Temas Resources Corp.'s regenerative chloride leach (RCL) vanadium metallurgical testwork announced earlier this year, the company has initiated the filing of a new process patent covering the extraction of vanadium from complex orebodies using mixed chloride leaching technology.

Highlights

• Temas has initiated the filing of a new process patent covering the extraction of vanadium from complex orebodies using its proprietary regenerative chloride leach (RCL) mixed chloride leaching technology.
• Patent filing establishes a priority filing date of July 8, 2026, protecting the company's latest metallurgical innovation.
• Patent entitled "chloride-based process for vanadium extraction."
• Filing follows the recent completion of the company's previously announced RCL vanadium metallurgical testwork on material from its wholly owned La Blache titanium-vanadium-iron project.
• Represents another expansion of Temas's growing intellectual property portfolio supporting future technology licensing opportunities.
• Follows Temas's June 29, 2026, results confirming extensive high-grade titanium-vanadium mineralization at La Blache, including vanadium grades of up to 0.48 per cent V2O5 (vanadium pentoxide) over broad intervals, underpinning the vanadium endowment to which the newly patented RCL process can be applied.
• Strengthens Temas's ability to create value from vanadium; both from its own La Blache and Lac Brule assets and from third party vanadium orebodies, concentrates and mine waste through RCL technology licensing and processing partnerships.
• The company continues to progress confidential discussions and third party lab testing with potential processing and licensing partners regarding deployment of the RCL platform across critical minerals.
• Reinforces Temas's strategy of developing proprietary metallurgical solutions across multiple critical minerals beyond titanium.

The patent application, entitled "chloride-based process for vanadium extraction" establishes a priority filing date of July 8, 2026, providing intellectual property protection for a novel process developed through the company's continuing metallurgical research and development activities.

The new patent application builds upon the encouraging results generated from Temas's proprietary RCL metallurgical testing on vanadium-bearing material from its 100-per-cent-owned La Blache titanium-vanadium-iron project in Quebec, Canada. The work further demonstrates the adaptability of the RCL technology platform across multiple critical minerals while expanding the company's growing portfolio of proprietary processing technologies.

As announced on June 29, 2026, Temas reported the first results from its systematic re-assay program at the Hervieux West deposit within La Blache, confirming extensive high-grade titanium-vanadium mineralisation together with gallium, scandium and chromium credits. Selected intervals returned vanadium grades of up to 0.48 per cent V2O5 over substantial widths, including 143.0 m at 0.48 per cent V2O5 (88.7 per cent Fe2O3 plus TiO2) in hole HWR-10-052. The vanadium extraction process now being patented is directly applicable to this style of Fe-Ti-V (iron-titanium-vanadium) oxide mineralization, reinforcing the potential for Temas to create value from both its own vanadium-bearing assets and comparable third party ore bodies through the RCL platform.

The company believes that securing intellectual property protection remains a critical component of its strategy to commercialize the RCL technology through future licensing agreements, strategic partnerships and deployment across global mineral projects. The Temas RCL technology platform comprises successfully granted United States and Canadian metallurgical process patents for the extraction of gold, iron, titanium, nickel and rare-earth elements using its proprietary mixed-chloride leaching technology.

In addition to this new patent application for the extraction of vanadium, the RCL platform is supported by eleven granted patents across multiple critical minerals and jurisdictions:

• Gold -- granted (United States);
• Gold -- granted (Canada);
• Iron -- granted (United States);
• Iron -- granted (Canada);
• Iron -- granted (India);
• Titanium -- granted (United States);
• Titanium -- granted (Canada);
• Nickel -- granted (United States);
• Nickel -- granted (Canada);
• Rare-earth elements -- granted (India);
• Rare-earth elements -- granted (Canada);
• Vanadium -- application filed, priority date July 7, 2026 (new).

Kyler Hardy, executive chairman, commented:

"One of our strategic objectives has always been to continually expand the RCL technology platform through the development of new process innovations. The successful application of RCL to vanadium extraction has resulted in a process that we believe is both novel and commercially valuable. Filing this patent represents another important milestone in strengthening Temas's intellectual property portfolio and reinforces the versatility of the RCL platform across multiple critical mineral applications."

Tim Fernback, president and chief executive officer, commented:

"The filing of this patent is another important step in transforming Temas from a critical minerals developer into a global clean metallurgical technology company. Every new patent strengthens our competitive position and builds long-term value in our technology licensing business. As demand accelerates for secure supplies of critical minerals such as vanadium, we believe proprietary processing technologies like RCL will become increasingly valuable to miners seeking lower-cost, environmentally responsible extraction. We continue to evaluate further RCL applications across critical minerals, including gallium, scandium, chromium and rare-earth elements, and intend to keep expanding our intellectual property portfolio as future metallurgical programs are completed."

Expanding the RCL intellectual property platform

The RCL technology platform continues to evolve beyond its original titanium applications into a broad hydrometallurgical process capable of recovering multiple critical minerals from complex ores, concentrates and mine waste.

The company's intellectual property strategy is focused on protecting novel metallurgical processes that can be commercialized through:

• Technology licensing;
• Joint venture opportunities;
• Strategic processing partnerships;
• Proprietary processing of Temas's wholly owned mineral assets.

The filing of "chloride-based process for vanadium extraction" represents another significant addition to Temas's expanding portfolio of proprietary RCL technologies.

About Temas Resources Corp.

Temas Resources is a technology-driven critical minerals company advancing a dual-business model built around proprietary processing innovation and strategic mineral ownership. The company's patented regenerative chloride leach (RCL) technology platform delivers significant operational cost reductions -- validated at up to 65-per-cent lower than traditional processing -- while dramatically reducing energy use and environmental impact.

Temas's RCL process is the foundation of its technology licensing and partnership business, enabling global mining and materials companies to adopt sustainable, high-margin metal extraction methods across a range of critical minerals including titanium, vanadium, nickel and rare-earth elements.

Complementing its technology division, Temas also owns 100 per cent of two advanced titanium-vanadium-iron projects in Quebec, Canada -- La Blache and Lac Brule -- which are strategically positioned to feed directly into the company's proprietary processing platform, creating a fully integrated mine-to-market supply chain for Western metals.

Through this combination of innovative IP commercialization and resource ownership, Temas Resources is positioned to deliver scalable, low-carbon solutions that strengthen Western critical-mineral independence and create long-term value for shareholders.

We seek Safe Harbor.